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《美国建筑竞赛 2》_美国《竞赛》杂志编辑部编;常文心译_14396670_9787559101389

【书名】:《美国建筑竞赛 2》
【作者】:美国《竞赛》杂志编辑部编;常文心译
【出版社】:沈阳:辽宁科学技术出版社
【时间】:2017
【页数】:283
【ISBN】:9787559101389
【SS码】:14396670

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内容简介

智利200周年纪念塔竞赛

Benny Borquez/Nicolas Loi

Tidy2 Marin

A.Andia,J.Fontana,C.Gomez and Engineer I.Barandiarianm

芝加哥伯纳姆纪念设计竞赛

David Woodhouse Architects

Hoerr Schaudt Landscape Architects

Sasaki Associates

霍布肯纪念馆竞赛

The Flow Group

Frederic Schwartz/Brian Tolle

Ralph Lerner/Kate Orff

KrysztofWodiczko/Julian Bonder

新泽西9/11纪念馆设计竞赛

Frederic Schwartz/Brian Tolle

Di Domenico&Partners

GBQC Architects

五角大楼纪念设计竞赛

Julie Beckman/Keith Kaseman

Shane Williamson

Michael Meredith

Mason Wickham/Edwin J.Zawadzki

Jacky Bowring/Room 4.1.3

缅因州大屠杀和人权中心竞赛

Harold Hon/Son Wooten

Ombeni Swai/Hiroshi lto/J.L.D'Allessandro/Hisashi Kubo

亨德森威尔市米尔艺术中心竞赛

Brian Healy Architects

Pugh+Scarpa&Eskew Dumez Ripple

Easton+Combs

高雄表演艺术中心竞赛

Mecanoo Architecten

Zaha Hadid Architects

Kiyoshi Sey Takeyama+AMORPHE

Artech Architects

门罗-阿瑟顿高中表演艺术中心竞赛

Hodgetts+Fung

Antoine Predock Architect/Sally Swanson Architects

Spencer and Associates/Rob Wellington Quiley

Starkweather Bondy Architects

TLCD Architecture

WLC Architects

路德伯班克当代艺术博物馆竞赛

envelope A+D with Red Maple Workshop

TLCD Architecture

Kava Massih Architects with O'Malley Wilson Westphal

Jensen+Macy Architects with Common Sense Design

台北表演艺术中心竞赛

OMA

Morphosis

Abalos+Sentkiewicz Architectos

Zaha Hadid Architects

Jacob+MacFarlane

MVRDV

SURV Associates

美国加州大学欧文分校竞赛

Steven Ehrlich Architects

MVE&Partners

Fentress Architects

2010年上海世博会英国展馆竞赛

Heatherwick Studio

EIGHT

Draw Architects and dcm Studios

Avery Architects

Marks Barfield Architects

密尔沃基伊利街广场竞赛

StoSS Landscape Architecture and Urbanism

Rogers Marvel Architects/Peter Lindsey Schaudt Landscape

南森·菲利普斯广场竞赛

Plant Architect Inc.

Baird Sampson Neuert Architects

Zeidler Partnership Architects

Rogers Marvel Architects

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